Macromolecular Symposia

Cover image for Vol. 351 Issue 1

April 13, 2010

Functional Polymers: With Electron Beam Lithography to Sub-Micrometer-Patterning of Conjugated Polymers

Functional Polymers: With Electron Beam Lithography to Sub-Micrometer-Patterning of Conjugated Polymers

E. Fisslthaler, M. Sezen, H. Plank, A. Blümel, S. Sax, W. Grogger, and E. J. W. List*

Spin coating, the most common deposition method for polymers, is not suitable for the production of patterned devices. However, the fabrication of devices with sub-micrometer active device dimensions will, open new possibilities for fundamental studies and enable improvements in device performance. List and co-workers have therefore added an electron beam lithography step to the device fabrication process and by this could fabricate patterned light emitting polymer layers with features as small as 2 μm. The patterning technique can be applied for all types of conjugated materials and it could even be combined with a fast 'large scale' structuring methods like inkjet printing, to allow for refinement of these patterns on a micrometer scale.

Macromol. Chem. Phys., DOI: 10.1002/macp.200900665

Other contributions to the special series on functional polymers can be found here.

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