Macromolecular Rapid Communications
© WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Macromol. Rapid Commun. 20/2007
Cover: The cover picture describes a facile method for multi-tiered polymer nanopatterning by the combination of imprint- and photo-lithography. Imprint lithography generates nano-scale patterns by utilizing a hemispheric PDMS pad and a flexible mold, and subsequent photolithographic process imparts multi-tier to the imprinted nanopatterns. Further details can be found in the article N. Y. Lee and Y. S. Kim* on page 1995.