Macromolecular Rapid Communications

Cover image for Vol. 37 Issue 23

28_20/2007Macromol. Rapid Commun. 20/2007

Cover: The cover picture describes a facile method for multi-tiered polymer nanopatterning by the combination of imprint- and photo-lithography. Imprint lithography generates nano-scale patterns by utilizing a hemispheric PDMS pad and a flexible mold, and subsequent photolithographic process imparts multi-tier to the imprinted nanopatterns. Further details can be found in the article N. Y. Lee and Y. S. Kim* on page 1995.

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