Macromolecular Rapid Communications

Cover image for Vol. 35 Issue 16

November 29, 2012

TREND: Chemical Vapor Deposition for Solvent-Free Polymerization at Surfaces

TREND: Chemical Vapor Deposition for Solvent-Free Polymerization at SurfacesJose Luis Yagüe, Anna Maria Coclite, Christy Petruczok, Karen K. Gleason*

Initiated chemical vapor deposition (iCVD) polymerization is a very elegant technique for designing new patterns and tuning the chemistry available on any kind of surface. These polymers attract considerable attention in many different fields of application. This trends article highlights the latest achievements in the fabrication of new surfaces and functional materials via iCVD and presents significant insights in its scale-up process.

Macromol. Chem. Phys., DOI: 10.1002/macp.201200600

More information on the invited Talent, Trend, and Highlight articles in Macromolecular Chemistry and Physics can be found here.

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