© WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Editor-in-Chief: Peter Gregory, Deputy Editors: Mary Farrell, Duoduo Liang, Lorna Stimson
Online ISSN: 1521-4095
Associated Title(s): Advanced Electronic Materials, Advanced Energy Materials, Advanced Engineering Materials, Advanced Functional Materials, Advanced Healthcare Materials, Advanced Materials Interfaces, Advanced Materials Technologies, Advanced Optical Materials, Advanced Science, Particle & Particle Systems Characterization, Small
Issue 2/2004 Cover
Capillary force lithography can now deliver sub-100 nm features with the aid of a stiff but permeable mold and a slight pressure for conformal contact. The front cover shows a pattern created using the technique, which is reported by Khang and Lee on p.^176. Complete capillary filling of the fluoropolymer mold is made possible by its permeability, which allows trapped air to diffuse out.