18_19/2006Cover Picture: Templated Fabrication of Nanowire and Nanoring Arrays Based on Interference Lithography and Electrochemical Deposition (Adv. Mater. 19/2006)

On p. 2593, Ji and co-workers report on a novel fabrication technique for ideally ordered lateral nanowire and nanoring arrays based on interference lithography and electrochemical deposition. This approach allows the fabrication of metallic and semiconductor nanowire or nanoring arrays over wafer-scale areas and provides flexible control over shape, arrangement, and thickness of the nanowires and nanorings. The cover shows templated electrodeposited elliptical nanoring arrays and a cross-section of electrodeposited nanowires.

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