Advanced Materials

Cover image for Vol. 29 Issue 4

19_10/2007Cover Picture: Large-Area 3D Nanostructures with Octagonal Quasicrystalline Symmetry via Phase-Mask Lithography (Adv. Mater. 10/2007)

A novel method for producing large-area 3D nanostructured quasicrystalline materials uses 2D multiple exposure lithography to produce an octagonal quasiperiodic surface-relief template (background image). A replica in polydimethylsiloxane is then used as a phase mask to create 3D bicontinuous axial quasicrystalline SU-8 epoxy nanostructures (see insets), as reported on p. 1403 by Ion Bita, Edwin Thomas, and co-workers.

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