© WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Editor-in-Chief: Peter Gregory, Deputy Editors: Mary Farrell, Duoduo Liang, Lorna Stimson
Online ISSN: 1521-4095
Associated Title(s): Advanced Electronic Materials, Advanced Energy Materials, Advanced Engineering Materials, Advanced Functional Materials, Advanced Healthcare Materials, Advanced Materials Interfaces, Advanced Optical Materials, Advanced Science, Particle & Particle Systems Characterization, Small
Cover Picture: Large-Area 3D Nanostructures with Octagonal Quasicrystalline Symmetry via Phase-Mask Lithography (Adv. Mater. 10/2007)
A novel method for producing large-area 3D nanostructured quasicrystalline materials uses 2D multiple exposure lithography to produce an octagonal quasiperiodic surface-relief template (background image). A replica in polydimethylsiloxane is then used as a phase mask to create 3D bicontinuous axial quasicrystalline SU-8 epoxy nanostructures (see insets), as reported on p. 1403 by Ion Bita, Edwin Thomas, and co-workers.