Advanced Materials

Cover image for Vol. 27 Issue 20

19_21b/2007Inside Front Cover: Direct Patterning, Conformal Coating, and Erbium Doping of Luminescent nc-Si/SiO2 Thin Films from Solution Processable Hydrogen Silsesquioxane (Adv. Mater. 21/2007)

Patterned nanostructure arrays of luminescent, oxide-embedded silicon nanocrystals (nc-Si) are formed by reductively thermally processing e-beam patterns of hydrogen silsesquioxane (HSQ). While traditionally employed as a negative type e-beam resist, HSQ is shown to produce thin films, non-flat conformal coatings, and sub-10 nm structures that contain luminescent nc-Si. The variety of morphologies (structures) that can be produced by this method highlights the versatility of HSQ as a nc-Si precursor, report Jonathan Veinot and co-workers from the University of Alberta, Canada on p. 3513.

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