© WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Editor-in-Chief: Peter Gregory, Deputy Editors: Mary Farrell, Duoduo Liang, Lorna Stimson
Online ISSN: 1521-4095
Associated Title(s): Advanced Electronic Materials, Advanced Energy Materials, Advanced Engineering Materials, Advanced Functional Materials, Advanced Healthcare Materials, Advanced Materials Interfaces, Advanced Optical Materials, Advanced Science, Particle & Particle Systems Characterization, Small
Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)
Cationic and anionic polymers provide negative resists for electron beam lithography. These patterned polymer features can then be employed as templates for electrostatic self-assembly of magnetic, metallic, or semiconducting nanoparticles, or for electroless deposition of metals. This synergistic integration of bottom-up and top-down methodologies, reported by Vincent Rotello and co-workers on p. 2561 combines the versatility and modularity of self-assembly processes and the proven capabilities of lithographic techniques.