Advanced Materials

Cover image for Vol. 27 Issue 37

20_13/2008Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Cationic and anionic polymers provide negative resists for electron beam lithography. These patterned polymer features can then be employed as templates for electrostatic self-assembly of magnetic, metallic, or semiconducting nanoparticles, or for electroless deposition of metals. This synergistic integration of bottom-up and top-down methodologies, reported by Vincent Rotello and co-workers on p. 2561 combines the versatility and modularity of self-assembly processes and the proven capabilities of lithographic techniques.

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