Advanced Materials

Cover image for Vol. 28 Issue 45

24_23i/2012Template Patterning: Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning (Adv. Mater. 23/2012)

The image depicts the flexible control over the directed self-assembly of block copolymers that can be achieved using small topographical templates. On page 3107, H.-S. P. Wong and co-workers explain how differently shaped templates cause the block copolymer to self-assemble to form corresponding nanopatterns, providing a potential solution to contact-hole patterning for integrated circuits beyond the 22 nm technology node.

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