Advanced Materials

Cover image for Vol. 27 Issue 38

24_31b/2012Topographic Templating: Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer (Adv. Mater. 31/2012)

By functionalizing lithographically defined posts with a brush consisting of the majority block of a block copolymer, various morphologies can be formed in a templated self-assembled pattern, as reported by K. K. Berggren, C. A. Ross, and co-workers on page 4249. In the cover image, square-symmetric post arrays produce a similarly square-symmetric microdomain lattice, coincidentally doubling the pattern density.

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