Advanced Materials

Cover image for Vol. 27 Issue 44

April 11, 2002

Patterning semiconducting polymersà.

The direct patterning of functional semiconducting polymers has been achieved with a nano-imprint lithography technique. The room-temperature process described is time-saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated (R. Zentel et al., April 18; Adv. Mater. 2002, 14, 588-591).

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