Advanced Materials

Cover image for Vol. 27 Issue 4

Editor-in-Chief: Peter Gregory, Deputy Editors: Mary Farrell, Duoduo Liang, Lorna Stimson

Online ISSN: 1521-4095

Associated Title(s): Advanced Energy Materials, Advanced Engineering Materials, Advanced Functional Materials, Advanced Healthcare Materials, Advanced Materials Interfaces, Advanced Optical Materials, Particle & Particle Systems Characterization, Small

April 11, 2002

Patterning semiconducting polymersà.

The direct patterning of functional semiconducting polymers has been achieved with a nano-imprint lithography technique. The room-temperature process described is time-saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated (R. Zentel et al., April 18; Adv. Mater. 2002, 14, 588-591).

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