Advanced Materials

Cover image for Vol. 26 Issue 28

Editor-in-Chief: Peter Gregory, Deputy Editors: Martin Ottmar, Carolina Novo da Silva, Lorna Stimson

Online ISSN: 1521-4095

Associated Title(s): Advanced Energy Materials, Advanced Engineering Materials, Advanced Functional Materials, Advanced Healthcare Materials, Advanced Materials Interfaces, Advanced Optical Materials, Particle & Particle Systems Characterization, Small

May 21, 2002

Robust multilayer patterns...

Robust multilayer patterns have been created via layer-by-layer self-assembly using a photochemical linking process that involves aromatic azo group cleavage and coupling with carbonyl oxygens from an adjacent polymer strand. The patterning is based on the solubility difference of the photoreactive multilayer before and after UV irradiation (X. Zhang et al., Adv. Mater. 2002, 14, 805-809).

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