Plasma Processes and Polymers

Cover image for Vol. 15 Issue 2

Online ISSN: 1612-8869

Recently Published Issues

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Special Issues


  • Plasma and Agriculture
    Editor-in-Chief: Pietro Favia
    Guest Editors: Matteo Gherardi (University of Bologna, Italy), Masaharu Shiratani (Kyushu University, Japan) and Nevena Puac (University of Belgrade, Serbia)
  • Plasma and Liquids
    Editor-in-Chief: Riccardo d’Agostino
    Guest Editors: Petr Lukes (Institute of Plasma Physics, Prague, Czech Republic) and Bruce R. Locke (Florida State University, USA)


Recently Published Articles

  1. Enhancing adhesion and polymerization of lipase-plasma-polymerized-ethylene coatings deposited with planar dielectric-barrier-discharge-type aerosol-assisted atmospheric-pressure plasma system

    Yun-Chien Cheng, Chun-Ping Hsiao, Yung-Hsin Liu, Chu-Hao Yang, Chun-Yi Chiang, Tsung-Rong Lin, Yi-Wei Yang and Jong-Shinn Wu

    Version of Record online: 23 FEB 2018 | DOI: 10.1002/ppap.201700173

    Thumbnail image of graphical abstract

    In this study, the adhesion and polymerization of the aerosol-assisted atmospheric-pressure plasma deposition (AAAPPD) deposited lipase-plasma-polymerized ethylene (lipase-PPE) coatings were improved by increasing applied voltage, decreasing ceramic-dielectric thickness, and adding a pre-coated PPE buffer layer. According to the results, we also hypothesized the related mechanisms of the AAAPPD process.

  2. Formation of lateral chemical gradients in plasma polymer films shielded by an inclined mask

    Marianne Vandenbossche, Laurène Petit, Julie Mathon-Lagresle, Fabrizio Spano, Patrick Rupper, Laetitia Bernard and Dirk Hegemann

    Version of Record online: 23 FEB 2018 | DOI: 10.1002/ppap.201700185

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    Chemical and structural analyses of a[BOND]C:H:O lateral gradient coatings showed three main areas: 1) the unmasked area, with [O]PPF/[C]PPF ∼19%; 2) the first 1 cm below the mask close to the mask/plasma edge with [O]PPF/[C]PPF ∼26%; and 3) the fully masked area, with [O]PPF/[C]PPF ∼13%. This result highlights the diffusion of the O-containing film-forming species below the mask, and their separation over the surface due to their different sticking probabilities.

  3. Synergistic effect of VUV photons and F atoms on damage and etching of porous organosilicate films

    Dmitry V. Lopaev, Sergey M. Zyryanov, Alexey I. Zotovich, Tatyana V. Rakhimova, Yury A. Mankelevich, Alexander T. Rakhimov and Mikhail R. Baklanov

    Version of Record online: 19 FEB 2018 | DOI: 10.1002/ppap.201700213

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    Synergistic effect between VUV photons and F atoms in both damage and etching of porous organosilicate (OSG) low-k films was studied. The joint exposure can significantly exceed the sum of the separate exposures to VUV photons and F atoms especially under lowered temperature. The energy of absorbed photons allows F atoms to overcome the activation barrier of the reactions on a pore surface.

  4. You have free access to this content
    Special issue: Plasma and agriculture

    Matteo Gherardi, Nevena Puač and Masaharu Shiratani

    Version of Record online: 16 FEB 2018 | DOI: 10.1002/ppap.201877002

  5. Energy efficient dry reforming process using low temperature arcs

    Duy Khoe Dinh, Seongil Choi, Dae Hoon Lee, Sungkwon Jo, Kwan-Tae Kim and Young-Hoon Song

    Version of Record online: 9 FEB 2018 | DOI: 10.1002/ppap.201700203

    Thumbnail image of graphical abstract

    CH4-CO2 reforming induced by AC rotating arc was investigated. The novel AC rotating arc can control the degree of thermal activation or the reaction temperature. Effects of the CH4/CO2 ratio, specific energy input (SEI) were theoretically and experimentally investigated. A conversion of almost 100% is achievable. Proposed technology enabled the lowest cost of the reaction ever reported.