Plasma Processes and Polymers

Cover image for Vol. 12 Issue 7

Online ISSN: 1612-8869

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Recently Published Articles

  1. Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces

    Guido Grundmeier, Achim von Keudell and Teresa de los Arcos

    Article first published online: 20 JUL 2015 | DOI: 10.1002/ppap.201500087

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    Plasma processes are widely used for the deposition of thin films and/or the functionalization of material surfaces and interfaces ranging from inorganic to organic structures. The characterization of such plasma-modified surfaces is challenging and most efficiently performed by optical methods. The aim of this review is to present both the fundamentals and selected experimental approaches of in situ reflection Fourier Transform Infrared Spectroscopy (FTIR) spectroscopy methods with a focus on the application in plasma interface chemistry.

  2. Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films

    Felix Mitschker, Jan Dietrich, Berkem Ozkaya, Teresa de los Arcos, Ignacio Giner, Peter Awakowicz and Guido Grundmeier

    Article first published online: 20 JUL 2015 | DOI: 10.1002/ppap.201500085

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    Oxidative degradation of polymer surface-near regions during exposure to plasma deposition processes of silicon oxide is monitored as a function of absolutely quantified atomic oxygen fluences. Determination of atomic oxygen fluence is performed by means of quantitative optical emission spectroscopy. Self-assembled monolayers that mimic an aliphatic polymer stay intact if the atomic oxygen fluence is below 1.0 · 1022 m−2.

  3. Toward a Better Understanding of the Influence of the Hydrocarbon Precursor on the Mechanical Properties of a-C:H Coatings Synthesized by a Hybrid PECVD/PVD Method

    Damien Thiry, Aurore De Vreese, Fabian Renaux, Julien L. Colaux, Stéphane Lucas, Yannick Guinet, Laurent Paccou, Etienne Bousser and Rony Snyders

    Article first published online: 17 JUL 2015 | DOI: 10.1002/ppap.201500050

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    The purpose of this work is to enlarge the comprehension about the influence of the chemical precursor (CH4 vs. C2H2) on the mechanical properties of amorphous hydrogenated carbon film (a-C:H) synthesized by a PECVD/PVD hybrid method. The whole set of our results enables to highlight the influence of other factors (e.g., cross-linking degree, branching character) than the sp3 and hydrogen content for determining the hardness of the a-C:H layers.

  4. Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

    Dirk Hegemann, Miroslav Michlíček, Noémi E. Blanchard, Urs Schütz, Dominik Lohmann, Marianne Vandenbossche, Lenka Zajíčková and Martin Drábik

    Article first published online: 16 JUL 2015 | DOI: 10.1002/ppap.201500078

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    In order to determine the influence of plasma reactor geometry, the same experimental range for the deposition of a-C:H:O plasma polymer films is applied to three different reactor configurations varying in its degree of asymmetry. Mainly, the deposition conditions at the driven electrode are found to enable a high control over film properties when both gas phase and surface processes are considered. Permanent hydrophilic plasma coatings can thus be achieved.

  5. Ellipsometric Porosimetry and Electrochemical Impedance Spectroscopy Characterization for Moisture Permeation Barrier Layers

    Alberto Perrotta, Santiago J. García and Mariadriana Creatore

    Article first published online: 16 JUL 2015 | DOI: 10.1002/ppap.201500084

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    Electrochemical impedance spectroscopy (EIS) and ellipsometric porosimetry (EP) are combined for the characterization of the nanoporosity and pore size distribution of PE-CVD SiO2 acting as moisture barrier layers. Exploiting the complementary features of the two techniques, the role of specific pore size range in affecting the intrinsic barrier properties is disclosed. Additionally, EIS is found to detect the presence of macro-scale defects.