Plasma Processes and Polymers
Copyright © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Online ISSN: 1612-8869
Materials Science Weekly Newsletter
Recently Published Articles
- Deposition of Non-Fouling PEO-Like Coatings Using a Low Temperature Atmospheric Pressure Plasma Jet
Charlie P. Stallard, Pavel Solar, Hynek Biederman and Denis P. Dowling
Article first published online: 26 MAY 2015 | DOI: 10.1002/ppap.201500034
PEO-like films have been extensively investigated for their ability to prevent protein attachment. However, the mechanism of prevention is not fully understood. There are varying reports regarding the % retention of non-fouling groups required to achieve foul resistant properties. In this work we use two monomers to compare the fouling performance of plasma deposited PEO-like films exhibiting increasing COC retention and different polymer structures.
- In situ IR Spectroscopy as a Tool to Better Understand the Growth Mechanisms of Plasma Polymers Thin Films
Sylvie Ligot, Damien Thiry, Pierre-Antoine Cormier, Patrice Raynaud, Philippe Dubois and Rony Snyders
Article first published online: 26 MAY 2015 | DOI: 10.1002/ppap.201400193
In this work, a new methodology allowing determining apparent sticking coefficients of specific fragments in plasma polymerization discharges is reported. As a case study, ethyl-lactate has been used as a precursor for synthesizing ester-containing plasma polymer films. By means of in situ FTIR spectroscopy and kinetic gas theory, the reactive ester-bearing fragments flux incoming to the substrate was estimated while the density of ester groups in the plasma polymer has been probed by XPS. The comparison of these values allows calculating an incorporation efficiency for the ester-bearing fragments.
- Tunable Optical Properties of SiNx Thin Films by OES Monitoring in a Reactive RF Magnetron Plasma
Iulian Pana, Catalin Vitelaru, Nicolae Catalin Zoita and Mariana Braic
Article first published online: 26 MAY 2015 | DOI: 10.1002/ppap.201400202
The reactive process of silicon sputtering an argon/nitrogen environment is analyzed and described by using optical emission spectroscopy as a main diagnostic tool. The correlation between the reactive process and the thin film properties is established by analyzing the optical characteristics of deposited SiNx, with the scope of obtaining tunable optical properties.
- Low-Pressure Plasma After-Treatment of Pollutants Emitted During Semiconductor Manufacturing
Min Hur, Jae Ok Lee, Woo Seok Kang and Young-Hoon Song
Article first published online: 21 MAY 2015 | DOI: 10.1002/ppap.201500046
Feasibility tests of abating and stabilizing pollutants emitted during semiconductor manufacturing are performed by using a plasma reactor placed before a vacuum pump. A high voltage is applied to the metal electrode enwrapping an insulator body. Abatement characteristics of N2O, CF4, CHF3, NF3, C3H6, TEMAZ, and SiO2 particles are analyzed with an emphasis on the role of reactant gases.
- Plasma Enhanced CVD of Organosilicon Thin Films on Electrospun Polymer Nanofibers
Eva Kedroňová, Lenka Zajíčková, Dirk Hegemann, Miloš Klíma, Miroslav Michlíček and Anton Manakhov
Article first published online: 18 MAY 2015 | DOI: 10.1002/ppap.201400235
Low pressure RF plasma discharge and atmospheric pressure RF plasma jets were used for organosilicon plasma polymers deposition on PVA and PA6 polymer nanofibers prepared by electrospinning. The affect of deposition conditions on resulting properties of modified nanofibers like surface morphology, chemical composition, and wettability were investigated.