Plasma Processes and Polymers
© WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Online ISSN: 1612-8869
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Recently Published Articles
- Contact Angle Decay Model to Study Plasma Afterglow Activation of Polymers
Gina Oberbossel, Serge Zihlmann, Christian Roth and Philipp Rudolf von Rohr
Version of Record online: 23 MAY 2016 | DOI: 10.1002/ppap.201600022
A semi-empirical model is used to describe treatment time – dependent contact angles measured on afterglow activated polyethylene sheets. Two exponential decay processes characterize the obtained contact angle decay. Fit parameters are compared for different discharge configurations and the influence of dielectric barrier thickness, gas flow rate and electrode length on the speed of contact angle decay is discussed.
- Nebulization of Nanocolloidal Suspensions for the Growth of Nanocomposite Coatings in Dielectric Barrier Discharges
Jacopo Profili, Olivier Levasseur, Jean-Bernard Blaisot, Anja Koronai, Luc Stafford and Nicolas Gherardi
Version of Record online: 19 MAY 2016 | DOI: 10.1002/ppap.201500223
SiO2–TiO2 nanocomposite thin films are produced by alternating the deposition of dense SiO2 layers by Atmospheric Pressure Townsend Discharge using HMDSO as the growth precursor in N2/N2O gas mixtures and the collection of TiO2 nanoparticles (NPs) through the nebulization of a colloidal suspension on a freshly deposited silica-like thin film. This process is efficient and relatively fast to produce nanocomposite thin films at atmospheric pressure with a dense inorganic matrix. The agglomeration of TiO2 NPs and their collection on the substrate is carefully studied. In the present conditions, their collection rate can be as high as 3.4 μg · cm−2 · min−1, keeping sizes of the aggregates in the 100 nm range.
- Selective Plasma Etching of Polyphenolic Composite in O2/Ar Plasma for Improvement of Material Tracking Properties
Harinarayanan Puliyalil, Gregor Filipič and Uroš Cvelbar
Version of Record online: 12 MAY 2016 | DOI: 10.1002/ppap.201600005
Selective plasma etching is used to remove the surface polymer layer from the glass-ﬁlled polyphenolic composite, keeping the ﬁllers intact, and thus improving the electrical insulation sufﬁciently that the material could be used for commercial applications according to IEC standards. The etching rate is controlled by addition of inertial Ar to O2 plasma discharge in different concentrations, and the etching rate dependency on plasma parameters is identified.
- Plasma-Produced Vertical Carbonous Nanoflakes for Li-Ion Batteries
Jieyang Wu, Yuanjun Shao, Biben Wang, Kostya (Ken) Ostrikov, Jia Feng and Qijin Cheng
Version of Record online: 6 MAY 2016 | DOI: 10.1002/ppap.201600029
A custom-designed plasma-enhanced horizontal tube furnace deposition system is used to synthesize vertical carbonous nanoflakes (VCNFs) on copper foils without any binders or catalysts; the VCNFs are used as a cathode material for Li-ion batteries which demonstrate stable efficiency of 99% and specific capacity of 110 mAh g−1 over 100 charge-discharge cycles.
- Study of the VHF Plasma Etching of Micro/Nano Patterned PMMA Coated on Ultra-Thin Flexible Glass Substrates
Aparajita Mandal, Arindam Kole, Sean M. Garner and Partha Chaudhuri
Version of Record online: 25 APR 2016 | DOI: 10.1002/ppap.201600016
Flexible substrates are useful for roll to roll production of photovoltaic modules. This study is interesting for understanding the plasma etching of micro/nano patterned PMMA coated on ultra-thin flexible glass substrates in a plasma reactor under very high frequency (VHF). The flexible glass substrate enabled thermal embossing processes at 165 °C, dimensional stability for sub-micron feature resolution, as well as an etch stop during plasma etching. Both the processes of surface reactions and the ion impact energy are found to play important roles in the removal of the PMMA during plasma etching depending on the etching time.