Plasma Processes and Polymers

Cover image for Vol. 11 Issue 10

Online ISSN: 1612-8869

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Recently Published Articles

  1. Fabrication, Characterization, and Comparison of Oxygen-Rich Organic Films Deposited by Plasma- and Vacuum-Ultraviolet (VUV) Photo-Polymerization

    Juan-Carlos Ruiz, Pierre-Luc Girard-Lauriault and Michael R. Wertheimer

    Article first published online: 20 OCT 2014 | DOI: 10.1002/ppap.201400146

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    Thin O-containing films were produced by vacuum-ultraviolet (VUV) photo-polymerization or by low-pressure r.f. plasma-assisted CVD, using ethylene (C2H4) with one of several O-containing oxidizer molecules, O2, CO2, or N2O. Analyses were performed by XPS (with or without chemical derivatization using TFAA to determine [[BOND]OH] content), and by IRRAS-FTIR. Nominally similar coatings displayed rather different structures and characteristics.

  2. Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration

    Cédric Vandenabeele, Rémy Maurau, Simon Bulou, Frederic Siffer, Mathieu Gérard, Thierry Belmonte and Patrick Choquet

    Article first published online: 18 OCT 2014 | DOI: 10.1002/ppap.201400098

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    A morphological, kinetic, and chemical study of thin films deposited from dichloromethane on a metallic wire moving through a tubular atmospheric pressure dielectric barrier discharge is presented. By carefully setting the plasma parameters, high quality layers are obtained with high deposition rates. Complex plasma chemistry is observed, with transitions from organic to inorganic structures.

  3. Densification and Hydration of HMDSO Plasma Polymers

    Noémi E. Blanchard, Barbara Hanselmann, Johannes Drosten, Manfred Heuberger and Dirk Hegemann

    Article first published online: 16 OCT 2014 | DOI: 10.1002/ppap.201400118

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    The influence of the energy density at the surface and in the gas phase on film densification of HMDSO plasma polymers is investigated. The deposited films are characterized by XPS and their aging behavior in air and water is studied using contact angle measurements and silver release studies. All films are effectively hydrated on time scales depending on the applied process conditions.

  4. Generation of Silicon Nanostructures by Atmospheric Microplasma Jet: The Role of Hydrogen Admixture

    Barbara Barwe, Adrian Stein, Ondřej E. Cibulka, Ivan Pelant, Jaafar Ghanbaja, Thierry Belmonte and Jan Benedikt

    Article first published online: 16 OCT 2014 | DOI: 10.1002/ppap.201400047

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    This article reports results regarding the use of a microplasma jet as a generation tool for silicon nanostructures. We demonstrate that the microplasma source can be used to form silicon nanocrystals at atmospheric pressure using a gas mixture of Ar/SiH4/H2. Further, the role of hydrogen admixture in the particle generation process is investigated. This work contributes to the understanding of silicon nanocrystal generation mechanism in non-equilibrium atmospheric pressure microplasmas.

  5. Catalytic Non-Thermal Plasma Decomposition of Ethylene by Using ZrO2 Nanoparticles

    Mani Sanjeeva Gandhi and Young Sun Mok

    Article first published online: 16 OCT 2014 | DOI: 10.1002/ppap.201400121

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    Nanosized ZrO2acts as a catalyst for non-thermal plasma decomposition of volatile organic compound. Unlike ZrO2 pellets, nanosized ZrO2 was found to exhibit catalytic activity for the decomposition of ethylene, and it showed stable decomposition performance even after 80-h continuous operation, suggesting that it is able to withstand deactivation without substantial loss in its catalytic activity, which is an important criterion for industrial applications.

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