Plasma Processes and Polymers

Cover image for Vol. 13 Issue 9

Online ISSN: 1612-8869

Editors-in-Chief
Riccardo d'Agostino (University of Bari, Italy)
Pietro Favia (University of Bari, Italy)
Christian Oehr (Fraunhofer Institute for Interfacial Engineering and Biotechnology, Stuttgart, Germany)
Michael R. Wertheimer (École Polytechnique de Montréal, Canada)

Managing Editor
Renate Förch (EurA Consult AG, Ellwangen, Germany)

International Advisory Board
Farzaneh Arefi-Khonsari (Ecole Nationale Supérieure de Chimie de Paris, France)
Jan Benedikt (Ruhr-Universität Bochum, Germany )
Hynek Biederman (Charles University, Prague, Czech Republic)
Annemie Bogaerts (University of Antwerp, Belgium)
James Bradley (University of Liverpool, United Kingdom)
Eun-Ha Choi (Department of Electrical and Biological Physics, Kwangwoon University, Seoul, South Korea)
Vittorio Colombo (University of Bologna, Italy)
Sylvain Coulombe ( McGill University, Montreal, Canada)
Gheorghe Dinescu (National Institute for Laser, Plasma and Radiation Physics, Bucharest, Romania)
Ellen R. Fisher (Colorado State University, Fort Collins, USA)
Francesco Fracassi (University of Bari, Italy)
Agustín R. González-Elipe (Instituto de Ciencia de Materiales de Sevilla, Spain)
David B. Graves (UC Berkeley, USA)
Hans J. Griesser (University of South Australia, Mawson Lakes, Australia)
Dirk Hegemann (EMPA, St. Gallen, Switzerland)
Andreas Holländer (Fraunhofer Institute for Applied Polymer Science, Golm, Germany)
Masaru Hori (Nagoya University, Japan)
Claus Peter Klages (Technische Universität Braunschweig, Germany )
Mounir Laroussi (Old Dominion University, Norfolk, USA)
Jae Koo Lee (Pohang University of Science and Technology, South Korea)
Bruce R. Locke (Florida State University and Florida Agricultural & Mechanical University, Tallahassee, USA)
Davide Mariotti (University of Ulster, Newtownabbey, United Kingdom)
Tomohiro Nozaki (Tokyo Institute of Technology, Tokyo, Japan)
Sabine Paulussen (VITO, Mol, Belgium)
Jean-Michel Pouvesle (University of Orleans, France)
Yuichi Setsuhara (JWRI, Osaka University, Japan)
Rony Snyders (Chemistry of Plasma Surface Interactions, University of Mons, Belgium)
Luc Stafford (Université de Montréal, Canada)
Mark Strobel (3M, St. Paul, USA)
M. C. M. van de Sanden (Eindhoven University of Technology, Netherlands)
Klaus Dieter Weltmann (INP Greifswald e.V., Germany)
Ai-Min Zhu (Dalian University of Technology, China)

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