Small

Cover image for Vol. 10 Issue 16

Cover Picture: Nanometer-Scale Modification and Welding of Silicon and Metallic Nanowires with a High-Intensity Electron Beam (Small 12/2005)

1_12/2005The cover picture shows an artificially colored transmission electron microscopy image of a 39-nm-diameter silicon nanowire, where the word “small” has been sculpted on the nanowire by a high-intensity electron beam. We demonstrate that an intense electron beam can be applied to create holes, gaps, and other patterns of atomic and nanometer dimensions on a single nanowire. The electron beam can also be used to weld individual nanowires, forming metal–metal or metal–semiconductor junctions. For more information, please read the Full Paper “Nanometer-Scale Modification and Welding of Silicon and Metallic Nanowires with a High-Intensity Electron Beam” by S. Y. Xu and co-workers on page 1221 ff.

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