© WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Editor-in-Chief: José Oliveira; Deputy Editors: Yan Li, Guangchen Xu
Online ISSN: 1613-6829
Associated Title(s): Advanced Electronic Materials, Advanced Energy Materials, Advanced Engineering Materials, Advanced Functional Materials, Advanced Healthcare Materials, Advanced Materials, Advanced Materials Interfaces, Advanced Materials Technologies, Advanced Optical Materials, Advanced Science, Particle & Particle Systems Characterization
Mass Sensors: Small 2/2009
Nanoelectromechanical mass sensors can be used to characterize material deposition rates in stencil lithography, report Francesc Perez-Murano and co-workers on p. 176. The material flux through nanometer-sized apertures is mapped with high spatial (below 1 µm) and deposition rate (below 10 pm s−1) resolutions by displacing the stencil apertures above the sensor. Material fluxes through apertures as small as 100 nm can be characterized using this technique.