5_02b/2009Mass Sensors: Small 2/2009

Nanoelectromechanical mass sensors can be used to characterize material deposition rates in stencil lithography, report Francesc Perez-Murano and co-workers on p. 176. The material flux through nanometer-sized apertures is mapped with high spatial (below 1 µm) and deposition rate (below 10 pm s−1) resolutions by displacing the stencil apertures above the sensor. Material fluxes through apertures as small as 100 nm can be characterized using this technique.

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