7_22/2011Lithography: A Portable, Benchtop Photolithography System Based on a Solid-State Light Source (Small 22/2011)

Solid-state photolithography (SSP) enables the capabilities of one of the most important tools in nano- and microfabrication, the mask aligner, to be performed on the benchtop. SSP can create patterns over a wide range of different length scales (down to several hundred nanometers) and over macroscale areas at a fraction of the cost of current instruments. The design of the SSP system alleviates the need for dedicated power supplies, vacuum lines, and cooling systems, and thus makes SSP a compact and portable photolithography option. The cover image is a close-up of the ultraviolet light-emitting diode (LED) array that is used as the solid-state light source for SSP. It is anticipated that SSP will expedite the integration of sub-wavelength patterns and microscale devices such as microfluidic channels into diverse research areas. For more information, please read the Communication “A Portable, Benchtop Photolithography System Based on a Solid-State Light Source” by M. D. Huntington and T. W. Odom,* beginning on page 3144.

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