Advanced Functional Materials

Cover image for Vol. 25 Issue 28
Advisory Board:T. Aida, Tokyo
T.D. Anthopoulos, Imperial
P. Bäuerle, Ulm
J.L. Brédas, Arizona
F. Caruso, Melbourne
J. Driscoll, Cambridge
L. Estroff, Cornell
P. Fratzl, MPI Golm
M. Grätzel, Lausanne
N.C. Greenham, Cambridge
W. T. S. Huck, Cambridge
G. Horowitz, Paris
R. A. J. Janssen, Eindhoven
L. Jiang, ICCAS
N. Kotov, Michigan
C.T. Kresge, Dow
M. Leclerc, Laval
S.T. Lee, Hong Kong
S.Y. Lee, KAIST
J.A. Lewis, Illinois
J. Maier, Stuttgart
S. Marder, Georgia Tech.
T. J. Marks, Northwestern Univ.
R. D. Miller, IBM
P. Mulvaney, Melbourne
W. L. Murphy, Wisconsin
J. Pérez-Ramírez, ETH Zürich
L.K. Ping, NU Singapore
J. Put, DSM
L. M. Qi, Peking Univ.
A.L. Rogach, Hong Kong
J. Rogers, Illinois
T. P. Russell, Univ. of Massachusetts
G. Schmid, Essen
E. Smela, Maryland
A. Stein, Minnesota
R. Tenne, Rehovot
Z.L. Wang, Georgia Tech.
K. Wu, Peking
Y. Xia, Georgia Tech.
Y. Yin, UC Riverside
D. Zhang, ICCAS
E. Zojer, TU Graz

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