Advanced Functional Materials

Cover image for Vol. 26 Issue 32

19_20/2009Photolithography: Fabrication of Flexible Binary Amplitude Masks for Patterning on Highly Curved Surfaces (Adv. Funct. Mater. 20/2009)

The front cover image shows a photolithographically defined gold pattern on the curved surface of a cylindrical glass lens (12.5-mm radius) using a photomask made by using the soft lithography protocols reported by Bowen and Nuzzo on page 3243. The described methods provide highly flexible photomasks, of both positive and negative image contrasts, that serve as amplitude masks for large area photolithographic patterning on a variety of curved (and planar) surfaces.

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