Advanced Functional Materials
© WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Editor-in-Chief: Joern Ritterbusch, Deputy Editors: Mary De Vita, Yan Li
Online ISSN: 1616-3028
Associated Title(s): Advanced Electronic Materials, Advanced Energy Materials, Advanced Engineering Materials, Advanced Healthcare Materials, Advanced Materials, Advanced Materials Interfaces, Advanced Materials Technologies, Advanced Optical Materials, Advanced Science, Particle & Particle Systems Characterization, Small
Photolithography: Fabrication of Flexible Binary Amplitude Masks for Patterning on Highly Curved Surfaces (Adv. Funct. Mater. 20/2009)
The front cover image shows a photolithographically defined gold pattern on the curved surface of a cylindrical glass lens (12.5-mm radius) using a photomask made by using the soft lithography protocols reported by Bowen and Nuzzo on page 3243. The described methods provide highly flexible photomasks, of both positive and negative image contrasts, that serve as amplitude masks for large area photolithographic patterning on a variety of curved (and planar) surfaces.