Advanced Functional Materials

Cover image for Vol. 25 Issue 33

22_19/20123D Patterning: 3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching (Adv. Funct. Mater. 19/2012)

On page 4004, Frank Niklaus and co-workers report on the fabrication of 3D nanostructures by alternating steps of silicon deposition and local ion implantation by focused ion beam (FIB) writing. The defined 3D nanostructures are formed in a final step by selective silicon etching.

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