Copyright © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Editor-in-Chief: Guido Kemeling; Editorial Board Chairs: Matthias Beller, Gabriele Centi, Licheng Sun
Impact Factor: 7.117
ISI Journal Citation Reports © Ranking: 2013: 17/148 (Chemistry Multidisciplinary)
Online ISSN: 1864-564X
Cover Picture: Atomic Layer Deposition of High Performance Ultrathin TiO2 Blocking Layers for Dye-Sensitized Solar Cells (ChemSusChem 6/2013)
The Cover Image shows the sequential dosing and purging of TiCl4 and H2O in atomic layer deposition (ALD) through step-like pressure changes in an effort to saturate the surface of fluorine doped tin oxide (FTO) glass with each reactant. These ultra-thin and uniform ALD TiO2 films with thicknesses of only 5 nm form a blocking layer on the rough FTO surface to be used in dye-sensitized solar cells (see the report by Kim et al. on page 1014) as the yallow photogenerated electrons to move to the FTO side effectively, thus inhibiting the recombination with holes at the FTO/electrolyte interface.