Advanced Materials Interfaces

Cover image for Vol. 4 Issue 8
Executive Advisory Board:usHans M. Christen, ORNL
Harald Fuchs, University of Münster
Karen K. Gleason, MIT
Bartosz A. Grzybowski, Northwestern University
Lei Jiang, CAS Beijing
Helmuth Möhwald, MPI Potsdam-Golm
Alexander Shluger, UCL
Advisory Board:usRaymond Adomaitis, UMERC
usAriando, NUS
usCharles Ahn, Yale University
Masakazu Aono, NIMS
Robert W. Carpick, University of Pennsylvania
Lifeng Chi, FUNSOM Institute, Soochow University
Paul K. Chu, City University of Hong Kong
Anjana Devi, Ruhr-University Bochum
Ulrike Diebold, Technical University Wien
Georg Duesberg, Trinity College Dublin
Mats Fahlman, Linköping University
Hongjin Fan, NTU
Jinlong Gong, Tianjin University
Augustín R. González-Elipe, CSIC
Michael Hitchman, University of Strathclyde
Gary Hodes, Weizmann Institute
Rene A. J. Janssen, TU Eindhoven
Pavel Jelinek, Czech Academy of Science
usAntoine Kahn, Princeton University
Mikhail Katsnelson, Radboud University, Nijmegen
usDavid Kisailus, UC Riverside
Mato Knez, nanoGUNE
Weimin Liu, LICP, CAS
Maria Antonietta Loi, University of Groningen
Graziella Malandrino, Universitá Degli Studi di Catania
Francis Maury, CIRIMAT
Gianfranco Pacchioni, University of Milano-Bicocca
Jeong Young Park, SCALE Laboratory, KAIST
Martyn Pemble, University College Cork
Michel Pons, SIMaP
Xiaohui Qiu, NCNST
Karsten Reuter, TU München
Shio-Woo Rhee, POSTECH
Mikko Ritala, University of Helsinki
Miquel Salmeron, LBNL
Udo Schwingenschlögl, KAUST
Yukihiro Shimogaki, University of Tokyo
Taolei Sun, Wuhan University of Technology
Dan Wang, Institute of Process Engineering, Chinese Academy of Sciences
Jianjun Wang, Institute of Chemistry, Chinese Academy of Sciences
Christof Wöll, KIT
Han Woong Yeom, POSTECH
Aleksander M. Wrobel, Polish Academy of Sciences
Kai Wu, Peking University
Jimmy Yu, The Chinese University of Hong Kong
Han Zuilhof, Wageningen UR
Qiang Zhang, Tsinghua University
Nanfeng Zheng, Xiamen University

SEARCH

SEARCH BY CITATION