Advanced Materials Technologies
Editor-in-Chief: Esther Levy
Online ISSN: 2365-709X
Associated Title(s): Advanced Electronic Materials, Advanced Energy Materials, Advanced Engineering Materials, Advanced Functional Materials, Advanced Healthcare Materials, Advanced Materials, Advanced Materials Interfaces, Advanced Optical Materials, Advanced Science, Particle & Particle Systems Characterization, Small
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Recently Published Articles
- Fabrication of Paper-Templated Structures of Noble Metals
Dionysios C. Christodouleas, Felice C. Simeone, Alok Tayi, Sonia Targ, James C. Weaver, Kaushik Jayaram, Maria Teresa Fernández-Abedul and George M. Whitesides
Version of Record online: 11 JAN 2017 | DOI: 10.1002/admt.201600229
A method for fabricating structures composed of noble metals and having physical morphology that resembles paper, thread, or fabric is described. A template (i.e., paper or cotton fabric) is loaded with solutions of metal precursors, and then the cellulosic component is burned off in a furnace. The resulting largely metallic structures are fibrous, liquid and gas permeable, and electrically conductive.
- 3D-Printed Autonomous Sensory Composites
Subramanian Sundaram, Ziwen Jiang, Pitchaya Sitthi-Amorn, David S. Kim, Marc A. Baldo and Wojciech Matusik
Version of Record online: 4 JAN 2017 | DOI: 10.1002/admt.201600257
A method for 3D-printing autonomous sensory composites requiring no external processing is presented. The composite operates at 1.5 V, locally performs active signal transduction with embedded electrical gain, and responds to stimuli, reversibly transducing mechanical strain into a transparency change. Digital assembly of spatially tailored solids and thin films, with encapsulated liquids, provides a route for realizing complex autonomous systems.
- Solvent-Based Soft-Patterning of Graphene Lateral Heterostructures for Broadband High-Speed Metal–Semiconductor–Metal Photodetectors
Yang Xu, Ayaz Ali, Khurram Shehzad, Nan Meng, Mingsheng Xu, Yuhan Zhang, Xinran Wang, Chuanhong Jin, Hongtao Wang, Yuzheng Guo, Zongyin Yang, Bin Yu, Yuan Liu, Qiyuan He, Xiangfeng Duan, Xiaomu Wang, Ping-Heng Tan, Weida Hu, Hai Lu and Tawfique Hasan
Version of Record online: 23 DEC 2016 | DOI: 10.1002/admt.201600241
A solvent-based “soft-patterning” strategy to fabricate graphene-fluorinated graphene (FG) lateral heterostructures with resolution down to 50 nm is demonstrated. The fabricated lateral graphene-FG heterostructures are employed to demonstrate a high speed metal–semiconductor–metal photodetector (<10 ns response time), with a broadband response from deep-UV (200 nm) to near-infrared (1100 nm) range.
- A Foolproof Method to Fabricate Integrated Electrodes with 3D Conductive Networks: A Case Study of MnOx@C-Cu as Li-Ion Battery Anode
Kangzhe Cao, Huiqiao Liu, Xiaoya Chang, Yang Li, Yijing Wang and Lifang Jiao
Version of Record online: 21 DEC 2016 | DOI: 10.1002/admt.201600221
A scaled-up foolproof method is developed to fabricate integrated electrodes with 3D conductive networks with the help of polyvinylpyrrolidone. It is low cost and environmentally friendly. The electrodes prepared in this method show superior electrochemical performances when evaluated as Li-ion battery anodes. This method can be extended to the construction of other functional integrated electrodes, with the potential for extensive applications.
- Shrinkage Control of Photoresist for Large-Area Fabrication of Sub-30 nm Periodic Nanocolumns
Hai Le-The, Erwin Berenschot, Roald M. Tiggelaar, Niels R. Tas, Albert van den Berg and Jan C. T. Eijkel
Version of Record online: 21 DEC 2016 | DOI: 10.1002/admt.201600238
An enabling technique for large-scale fabrication of highly-ordered size-tunable nanocolumn arrays without a deep-UV-laser source is successfully demonstrated. Periodic 110 nm diameter photoresist nanocolumns patternd by displacement Talbot lithography can be directly transferred to 110 nm bottom anti-reflection layer coating (BARC) nanocolumns using N2 plasma etching, or shrink-etched to sub-30 nm highly vertical BARC nanocolumns using O2/N2 plasma etching.