Volume 201, Issue 12 p. 2635-2638
Original Paper

Facet degradation of (Al,In)GaN laser diodes

Thomas Schoedl,

Institut für Angewandte und Experimentelle Physik, Universität Regensburg, Universitätsstr. 31, 93040 Regensburg, Germany

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Ulrich T. Schwarz,

Corresponding Author

Institut für Angewandte und Experimentelle Physik, Universität Regensburg, Universitätsstr. 31, 93040 Regensburg, Germany

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Stephan Miller,

OSRAM Opto Semiconductors GmbH, Wernerwerkstr. 2, 93049 Regensburg, Germany

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Andreas Leber,

OSRAM Opto Semiconductors GmbH, Wernerwerkstr. 2, 93049 Regensburg, Germany

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Michael Furitsch,

OSRAM Opto Semiconductors GmbH, Wernerwerkstr. 2, 93049 Regensburg, Germany

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Alfred Lell,

OSRAM Opto Semiconductors GmbH, Wernerwerkstr. 2, 93049 Regensburg, Germany

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Volker Härle,

OSRAM Opto Semiconductors GmbH, Wernerwerkstr. 2, 93049 Regensburg, Germany

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First published: 02 September 2004
Citations: 8

Abstract

We study the facet degradation behavior of (Al,In)GaN multiple quantum well laser diodes. Water vapor causes a fast degradation due to facet oxidation of the uncoated facet. Degradation in an inert nitrogen atmosphere is slow and comparable to degradation of GaN laser diodes with coated facets. We also observe a reversible increase in the threshold current density due to a change in absorption caused by surface charges. (© 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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