Volume 249, Issue 3 p. 480-484
Original Paper

Lateral charge carrier diffusion in InGaN quantum wells

J. Danhof,

Corresponding Author

Albert-Ludwigs-Universität Freiburg, IMTEK, Georges-Köhler-Allee 106, 79110 Freiburg, Germany

Fraunhofer Institute for Applied Solid State Physics IAF, Tullastraße 72, 79108 Freiburg, Germany

Phone: +49-761-5159282, Fax: +49-761-515971282Search for more papers by this author
H.-M. Solowan,

Albert-Ludwigs-Universität Freiburg, IMTEK, Georges-Köhler-Allee 106, 79110 Freiburg, Germany

Fraunhofer Institute for Applied Solid State Physics IAF, Tullastraße 72, 79108 Freiburg, Germany

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U. T. Schwarz,

Albert-Ludwigs-Universität Freiburg, IMTEK, Georges-Köhler-Allee 106, 79110 Freiburg, Germany

Fraunhofer Institute for Applied Solid State Physics IAF, Tullastraße 72, 79108 Freiburg, Germany

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A. Kaneta,

Kyoto University, Katsura Campus, Nishikyo-ku, Kyoto 615-2312, Japan

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Y. Kawakami,

Kyoto University, Katsura Campus, Nishikyo-ku, Kyoto 615-2312, Japan

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D. Schiavon,

Osram Opto Semiconductors GmbH, Leibnizstraße 4, 93055 Regensburg, Germany

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T. Meyer,

Osram Opto Semiconductors GmbH, Leibnizstraße 4, 93055 Regensburg, Germany

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M. Peter,

Osram Opto Semiconductors GmbH, Leibnizstraße 4, 93055 Regensburg, Germany

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First published: 19 January 2012
Citations: 13

Abstract

We investigated lateral charge carrier transport in indium gallium nitride InGaN/GaN multi-quantum wells for two different samples, one sample emitting green light at about 510 nm and the other emitting cyan light at about 470 nm. For the cyan light emitting sample we found a diffusion constant of 1.2 cm2/s and for the green light emitting sample 0.25 cm2/s. The large difference in diffusion constant is due to a higher point defect density in the green light emitting quantum wells (QWs) as high indium incorporation tends to reduce material quality.

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