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Advanced Materials
Communication

Synthesis and Fabrication of High‐Performance n‐Type Silicon Nanowire Transistors

G. Zheng

Department of Chemistry and Chemical Biology, Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA

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W. Lu

Department of Chemistry and Chemical Biology, Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA

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S. Jin

Department of Chemistry and Chemical Biology, Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA

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First published: 23 September 2004
Cited by: 296

The authors thank Yue Wu and Zhaohui Zhong for discussion. This work was supported by the Defense Advanced Research Projects Agency, National Cancer Institute, and the Ellison Medical Foundation.

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Abstract

Single crystal n‐type silicon nanowires (SiNWs) with controlled phosphorus dopant concentrations have been successfully synthesized for the first time (see Figure). Field‐effect transistor (FET) devices fabricated from these n‐SiNWs exhibit good device properties, with mobilities more than 100 times greater than previous reports, and comparable to high‐performance planar silicon FETs.

Number of times cited according to CrossRef: 296

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