Controlled Formation of Nanoribbons and Their Heterostructures via Assembly of Mass‐Selected Inorganic Ions

Control of nanomaterial dimensions with atomic precision through synthetic methods is essential to understanding and engineering of nanomaterials. For single‐layer inorganic materials, size and shape controls have been achieved by self‐assembly and surface‐catalyzed reactions of building blocks deposited at a surface. However, the scope of nanostructures accessible by such approach is restricted by the limited choice of building blocks that can be thermally evaporated onto surfaces, such as atoms or thermostable molecules. Herein this limitation is bypassed by using mass‐selected molecular ions obtained via electrospray ionization as building blocks to synthesize nanostructures that are inaccessible by conventional evaporation methods. As the first example, micron‐scale production of MoS2 and WS2 nanoribbons and their heterostructures on graphene are shown by the self‐assembly of asymmetrically shaped building blocks obtained from the electrospray. It is expected that judicious use of electrospray‐generated building blocks would unlock access to previously inaccessible inorganic nanostructures.


Introduction
[3] Owing to quantum confinement effects at the nanoscale, this dependence provides means to tune optical [4][5][6][7] and chemical properties [8][9][10] of nanoparticles, as well as means to access unique superconductivity, [11] electrochemical, [12] or lightmatter [13,14] phenomena in monolayer materials. [1,2]]29] Such a "bottom up" approach is widely accomplished by preparing the nanostructures on surfaces, [22][23][24]30] which takes advantage of confining and steering the assembly process in two dimensions via surface structures and surface-catalyzed reactions. Despe its widespread use, this strategy, however, relies on the transfer of building blocks from a source onto the surface by thermal evaporation, [31][32][33][34] which restricts the building blocks to the ones that are sufficiently volatile and stable at high temperatures, such as atoms or simple molecules.The constraint on the choice of usable building blocks limits the range of nanostructures accessible by such approach.
[48] Yet, due to the vast selection of usable building blocks, the soft landing technique remains to be an attractive tool to access the uncharted chemical space of inorganic nanostructures.For example, building blocks terminated with specific structures could yield nanostructures with tailored atomic termination that gives unique contact resistance or Schottky barrier.
Here, we extend the scope of ion soft landing technique in the field of inorganic nanostructure synthesis.We show that, by allowing precise selection of complex molecular building blocks and control of their deposited quantities on surface, the soft landing technique unlocks opportunities to prepare inorganic nanostructures that are presently inaccessible by conventional methods.As the first example, we show the formation of MoS 2 nanoribbons from mass-selected MoS ions (HS(MoS 3 ) N 1− , N = 4-8) soft landed on a freestanding, single-layer graphene at ambient temperature in vacuo by the Electrospray Ion Beam Deposition (ESIBD) [36,39] technique (see Experimental Section).Atomic level structural characterization of the nanoribbons by Scanning Transmission Electron Microscopy (STEM) corroborated by Density Functional Theory (DFT) calculations attributes the formation of MoS nanoribbons to the molecular asymmetry of the unique MoS building blocks deposited on the surface.We further show the perspective of the technique by using two different building blocks, MoS and WS ions, to generate two-component core-shell heterostructures and alloyed nanostructures.The precise control of deposited building blocks and their quantities enabled by the method permits dimensional and stoichiometry control of the resulting nanoribbons at a surface, thereby providing new systems to explore nanoribbon electronics [28] and photonics, [14] as well as a new synthesis strategy to the burgeoning field of two dimensional material synthesis.

Nanoribbons Formation by Assembly of Molecular Building Blocks
Mass-selected MoS ions (HS(MoS 3 ) N 1− , N = 4-8) deposited on graphene were observed to form single-layered MoS 2 nanoribbons by using STEM in High-Angle Annular Dark-Field (HAADF) mode (Figure 1), whose contrast is proportional to the thickness and the atomic mass of the object.We observed the entire series of HS(MoS 3 ) N 1− from N = 1-8 only when a relatively high concentration of (NH 4 ) 2 MoS 4 solution (≈10 mm) was electrosprayed, by taking advantage of the notion that high concentration promotes cluster formation. [49,50]Out of the observed MoS ion series, only HS(MoS 3 ) 1− and HS(MoS 3 ) 3 1− have been previously observed, where HS(MoS 3 ) 1− is a typical ion observed from solutions of MoS 4 2− salts, [51] while HS(MoS 3 ) 3 1− has been observed from gas phase dissociation of HMo 3 S 13 − ions. [52]We chose to study heavy MoS ions (HS(MoS 3 ) N 1− , N ≥ 4) due to their higher adsorption energies on graphene, which allow them to adhere to graphene stronger and to be retained on graphene long enough to form the nanoribbons (Figures S1 and S2, Supporting Information).
The nanoribbons were measured to be few microns in length and few nm in width with a significant amount of edges (an ≈4fold increase in edge length when compared to a solid nanoribbon with same dimensions, see Experimental Section for analysis) that are ideal for catalysis [53] and nanoscale electronics. [54]We find that the high number of step edges in these nanoribbons is significantly different from MoS 2 nanoribbons fabricated by electron beam irradiation [55] or by droplet evaporation, [23] which opens new opportunities to explore the chemistry and electronic properties of these step edges.
We confirmed the single-layer nature of the nanoribbons by observing similar HAADF contrast between the Mo atoms in the nanoribbons and single Mo adatoms on graphene (Figure S3, Supporting Information), evidencing that the nanoribbons were one atom thick.The presence of Mo and S in the nanoribbons was confirmed by the characteristic Mo peaks observed in energy-dispersive X-ray (EDX) spectroscopy (Mo-K and Mo-L) and S-L 2,3 edges observed in Electron Energy-Loss Spectroscopy (EELS) (Figure S4a, Supporting Information).Combining these results with the analysis of our STEM-HAADF images (Figure 2), we confirmed the presence of hexagonal MoS 2 (1H-MoS 2 ) in the nanoribbons, as evidenced by the symmetry and the measured Mo-Mo distance of 3.15 ± 0.05 Å matching those for 1H-MoS 2 (3.15 Å). [56] From these results, we conclude that the MoS 2 nanoribbons are formed by a quasi-1D assembly of deposited MoS molecules on graphene, which we note to deviate significantly from the typical triangular growth pattern of MoS 2 island obtained from vapor deposition techniques. [57]Our findings hence underscore the importance of building blocks in dictating the growth mechanism and the final nanostructures on surface.
To uncover the formation mechanism of the MoS 2 nanoribbons, we subsequently examined the effect of surface structures on the assembly of MoS ions into the nanoribbons.Remarkably, the nanoribbon formation was found to be strongly affected by the surface, since we only observed the nanoribbons on clean single-layer graphene, but not on contaminated single-layer graphene, bilayer graphene, or amorphous carbon.Assembly of MoS ions on single-layer and bilayer graphene contaminated with hydrocarbons [58] was observed to yield shorter nanoribbons with greater number of branches, whereas, on amorphous carbon surfaces, randomly shaped MoS islands were observed (Figure S5, Supporting Information).These results indicate that rough surfaces inhibit the nanoribbon formation and instead promote the formation of branches, while flat surfaces, such as clean single-layer graphene, promote the nanoribbon formation.We verified that the single-layer graphene used in our experiments was flat by confirming the absence of graphene ripples [59] in Scanning Electron Microscopy (SEM) images of our graphene samples (Figure S6, Supporting Information).We further confirm that the absence of graphene grain boundaries in our samples (Figure S7, Supporting Information), ruling out these line defects as the origin of the nanoribbon orientation (Figure S8, Supporting Information).
Further clues to the nanoribbon formation mechanism are revealed by STEM-HAADF imaging, which unveils the presence of adsorbed "molecular" MoS 2 that would play a key role in the nanoribbon formation.The "molecular" MoS 2 was identified from nanoribbon structures resolved at the atomic level by STEM-HAADF imaging and corroborated by DFT calculations (Figure 2).While the Mo atoms were observed with a single HAADF contrast evidencing the monolayer nature of the nanoribbon, the S atoms were observed with three different HAADF contrasts (Figure S9, Supporting Information).These three contrasts were interpreted by DFT calculations to be three different geometries of S atoms when observed from the top (Figure 2b): the bright contrast is due to two fully overlapped S atoms, the dim contrast is due to two partly overlapped S atoms, and the dark contrast is due to minimally overlapped S atoms.Consequently, the interpreted nanoribbon structures allow the "molecular" MoS 2 to be distinguished from the "condensed" domain of 1H-MoS 2 (Figure 2).The "molecular" MoS 2 features an S atom coordinated by two Mo atoms along its edge, and at its interior, an S atom coordinated by three Mo atoms (Figure S10, Supporting Information), similar to the MoS 3 intermediate in ref. [60] These distinct S atom coordinations may provide a new strategy to tailor contact resistance and Schottky barrier in metalsemiconductor junctions.As we detail below, the "molecular" MoS 2 is understood to be an important precursor to the "condensed" MoS 2 , and thus the MoS 2 nanoribbon.

Formation Mechanism of Nanoribbons
To account for the observation of "molecular" MoS 2, and to clarify its origin and role in the nanoribbon formation, we performed ab initio Molecular Dynamics (MD) calculations (see Experimental Section) to model the deposition and assembly of MoS molecules at a flat graphene surface.We first examined the deposition event by computing the most stable structure of the MoS ions in the gas phase and its subsequent landing dynamics on graphene.
We chose the Mo 8 species as a model system to study the chemical reactivities of the different S-terminations present in Mo 8 S 16 and HMo 8 S 25 species.The most stable gas-phase structure of HMo 8 S 25 1− ion was computed to strongly resemble the corresponding "molecular" Mo 8 S 16 on graphene (Figure S10, Supporting Information) with the only difference being: in "molecular" MoS 2 , two edge Mo atoms are bridged by one S atom, while in MoS ions, the two edge Mo atoms are bridged by two S atoms.This resemblance indicates that the "molecular" MoS 2 could be derived from the adsorbed MoS ions, as corroborated by our calculations revealing exothermic reaction pathways for "molecular" MoS 2 to be produced from the reaction between adsorbed MoS ions and chemisorbed S atoms, observed on graphene (Figure S3, Supporting Information).Notably, while HMo 8 S 25 1− ion is understood to possess a charge of −1e in the gas phase, Bader analysis of the adsorbed HMo 8 S 25 on graphene shows that the molecule has a charge of −0.05e.This result indicates that the adsorbed MoS ions are better understood as a neutral molecule on graphene as a result of the gas-phase MoS ions losing an electron upon adsorption to graphene.We expect that such electron transfer [61] is possible, because the energy of the filled molecular orbitals of the gas-phase MoS ions is higher than the Fermi level of the graphene.
The computed exothermic pathways linking HMo 8 S 25 to Mo 8 S 16 (Figure S11, Supporting Information) show chemisorbed S atoms (E ads = 1.8 eV) attaching to the S 2 edge of HMo 8 S 25 to give S 3 or S 4 edges that dissociate to leave an S 1 edge on the MoS molecule and weakly physisorbed S 2 (E ads = 0.3 eV) or S 3 (E ads = 0.4 eV), which we expect would desorb from graphene due to their low adsorption energies.Further conversion of all S 2 edges in HMo 8 S 25 to S 1 edges thereby converts HMo 8 S 25 to Mo 8 S 16 , which belongs to the "molecular" MoS 2 family and is expected to diffuse and assemble into nanoribbons.We note, however, that while energy considerations are important in such reactions, activation barriers and entropy may also play a role.Further support for the formation of "molecular" MoS 2 via reactions on the surface is given by our MD calculations showing that the structure of HMo 8 S 25 is preserved upon its landing on graphene (Figure S12, Supporting Information), thereby ruling out molecule-graphene collision as a mechanism for "molecular" MoS 2 formation.
To understand how "molecular" MoS 2 assemble into nanoribbons, we model the assembly of "molecular" MoS 2 on graphene at room temperature by simulating collisions between two "molecular" MoS 2 at varied angles and impact parameters (i.e., miss distance between two approaching objects) (see Experimental Section).Based on our MD calculations examining 100 different collision geometries, collisions between two "molecular" MoS 2 lead to either formation of a "condensed" MoS 2 island, or a network of coalesced "molecular" MoS 2 (Figure S13, Supporting Information), consistent with our experimental observations (Figure 2).In the formation of "condensed" MoS 2 , two "molecular" MoS 2 collide to form multiple new Mo-S bonds to yield a tetragonal MoS 2 island (1T-MoS 2 ), which, at longer timescales, is expected to spontaneously convert to a thermodynamically more stable hexagonal MoS 2 island (1H-MoS 2 ) observed in experiments.In the formation of coalesced "molecular" MoS 2 network, two "molecular" MoS 2 collide to form a limited number of Mo-S bonds that unite the two molecules, yielding a network of coalesced "molecular" MoS 2 observed in experiments.Our MD calculations, by giving "condensed" and "molecular" MoS 2 outcomes are consistent with the experimental observations, providing a basis to further understand the formation mechanism of MoS 2 nanoribbons.
The formation of MoS 2 nanoribbons is understood to be due to preferential assembly of "molecular" MoS 2 .By analyzing how "molecular" MoS 2 interacts with one another from our STEM-HAADF images (N = 636 pairs, see Experimental Section), a pair of "molecular" MoS 2 was found to prefer a head-to-head contact (50%) than head-to-side contact (33%) or side-to-side contact (16%).These results are corroborated by our MD calculations, which show that head-to-head collisions almost always result in a reactive outcome (95%, 19 out of 20 trajectories), while headto-side and side-to-side collisions result in less reactive outcomes (85%, 46 out of 54 trajectories; and 83%, 20 out of 24 trajectories, respectively).Our findings in both experiments and calculations hence suggest an increased reactivity of "molecular" MoS 2 at its terminal edges than its side edges.The anisotropic reactivity of "molecular" MoS 2 is understood to drive the anisotropic growth of MoS 2 island into MoS 2 nanoribbons observed in experiments.

Fine Tuning of Nanoribbon Structures
The formation of MoS 2 nanoribbons from the anisotropic assembly of asymmetric MoS building blocks informs a means to tune the final nanoribbon structures by the MoS species deposited on surface.We demonstrate this capability by varying the selected MoS ions (HS(MoS 3 ) N 1− ) deposited on graphene, starting from N ≥ 4 to N ≥ 6 (Figure 3).In all cases, we observed monolayer MoS 2 nanoribbons with similar porosity, albeit with different average widths.The porosity of the nanoribbons, determined for all three samples to be ≈2 nm edge length per 1 nm 2 of the nanoribbon area, were found to be ≈4-fold larger than that for a solid nanoribbon (see Supporting Information for detailed analysis).The widths of the nanoribbons were found to vary from 4.7 ± 1.7 nm for the case of N ≥ 4; 6.2 ± 2.2 nm for N ≥ 5; to 7.3 ± 2.8 nm for N ≥ 6 (see details in Figure S14, Supporting Information).In addition, we found that the quantity and the length of nanoribbons on the surface could be increased without varying their widths by increasing the amount of deposited MoS ions, as observed in samples with low and high coverage of MoS ions (Figure S15, Supporting Information).These findings thereby highlight the importance of controlling the building block species and their deposited quantities to tune the final state of the nanostructures on surface.

Two-Component Nanoribbon Heterostructures
To illustrate the perspective of the technique, we show that soft landing of mass-selected ions enables morphology control of nanoribbons consisting of two transition metals (Figure 4).We exemplify this for two-component (Mo and W) nanoribbons prepared by co-depositing MoS ions and WS ions on graphene.In the co-deposition experiment, we chose to deposit WS ions with a chemical formula similar to that for MoS ions, namely HS(WS 3 ) N 1− (Figure S16, Supporting Information).As a result, the WS ions (N ≥ 4) assembled into WS 2 nanoribbons (Figure 4b), similar to the MoS ions (Figure 4a).We confirmed the presence of W and S on the WS nanoribbons using EDX which revealed the characteristic W peaks (W-L) and S peaks (S-K) (Figure S4b, Supporting Information).The nanoribbons obtained from assembled WS ions suggest an assembly mecha-nism similar to that for MoS ions, which we exploited herein in our co-deposition experiments to keep the assembly mechanism as a constant.
The MoS and WS co-deposition experiments were observed to yield nanoribbon heterostructures with different morphology, depending on whether the building blocks were deposited sequentially (Figure 4c,d) or concurrently (Figure 4e).Sequential deposition of one type of ions followed by another type of ions yielded nanoribbons with a core-shell structure, be that MoS nanoribbons with WS shells (Figure 4c) or WS nanoribbons with MoS shells (Figure 4d), as confirmed by EDX (Figure S4c,d, Supporting Information).The core-shell structure suggests that the nanoribbon "core" formed by the first building blocks provides favorable nucleation sites for the second building blocks to form the "shell" of the nanostructure.In contrast, concurrent deposition of the two types of ions (Figure S17, Supporting Information) yielded alloyed nanoribbons with both Mo and W atoms incorporated into the nanoribbons (Figure S4e, Supporting Information).The MoWS-alloy structures were observed as W atoms substituting those sites, where Mo atoms were expected and vice versa (Figure 4e inset), suggesting that the MoS and WS building blocks assemble together to yield the observed alloyed nanoribbons.The co-deposition of MoS and WS building blocks, either sequential or concurrent, demonstrates a new means to prepare lateral heterostructures (or heterojunctions) of monolayer materials [62][63][64][65] or high entropy monolayer materials [66] using non-volatile, molecular building blocks.

Summary and Outlook
The assembly of non-volatile molecular building blocks enabled by soft landing of inorganic ions on single-layer graphene using the ESIBD technique is demonstrated to yield inorganic nanoribbons with unique and tunable composition, stoichiometry, and morphology as confirmed by atomic-resolved STEM-HAADF imaging.Unlike conventional vapor deposition techniques, our approach of soft landing mass-selected ions on surfaces provides control over the species of the building blocks and their quantities on surface.As an example, the present work shows the use of elongated building blocks to prepare a diverse range of 2D nanostructures, such as nanoribbons, as well as coreshell and alloyed nanoribbons.The use of ionic building blocks from the electrospray ionization allows the selection of building blocks down to specific isotopes or oxidation states, the use of in vacuo generated species, [67] the reduction of materials needed for deposition to few micromoles (μmol), and the use of lesshazardous and air-stable transition metal salts as transition metal sources.In addition, the use of electrospray opens the possibility to use of custom building blocks prepared by wet inorganic or organometallic synthesis, [68,69] as well as to integrate the field of 2D material synthesis to the high throughput electrospray-based technologies in combinatorial [69,70] or bioanalytical chemistry. [71]y bringing in techniques from various fields of chemistry, we anticipate that our method would be capable of providing synthetic access to a greater range of 2D materials that remain intractable at present by conventional thermal-based methods, and thus open new opportunities in structure-properties studies of 2D materials.

Experimental Section
Surface Preparation: Clean single-layer graphene was prepared closely following previously established procedures [72] using the PMMA-coated CVD-grown graphene on a Cu-foil (Graphenea S.A.) (PMMA = polymethyl methacrylate, CVD = chemical vapor deposition).Briefly, the Cu-foil was removed by placing the PMMA-graphene-Cu film in an etchant solution made of 8 g of ammonium persulfate in 100 mL of Milli-Q water.Following the Cu-removal, any remaining etchant residue on the PMMA-graphene stack was removed by rinsing in a Milli-Q water.The stack was subsequently transferred onto a holey SiN x support grid (Ted Pella, Inc., Catalog#: 21581-10) with the graphene-side being in contact with the grid.Prior to the transfer, the SiN grids featuring 1 μm diameter holes across the membrane were sputter coated with ≈10 nm of Pt that would catalyze the PMMA removal.To prepare the clean single-layer graphene for the deposition experiment, the PMMA was removed from the PMMA-graphene stack on the SiN grid by annealing the grid in ambient atmosphere at 300 °C for 30-60 min, whereupon the Pt sputtered on the grid catalyzed the oxidation of the PMMA.Clean single-layer graphene was consistently obtained by transferring the grid into vacuum chambers, while the grid was hot (within 2-3 min after annealing).On the other hand, to obtain the single-layer graphene contaminated with hydrocarbon impurities, [58] the annealed graphene-on-SiN-grid was transferred into the vacuum chambers after it cooled to room temperature.The contaminated bilayer graphene was obtained as the bilayer graphene impurities present in the starting material of the single-layer graphene samples.The holey carbon surface (Quantifoil TEM substrate) was obtained commercially and used without further treatment (Ted Pella, Inc., Catalog#: 656-200-CU).
Ion Deposition: Ammonium tetrathiomolybdate, (NH 4 ) 2 MoS 4 , (99.97%, Sigma Aldrich, Catalog#: 323446, CAS: 15060-55-6) and ammonium tetrathiotungstate, (NH 4 ) 2 WS 4 , (≥99.9%,Sigma Aldrich, Catalog#: 336734, CAS: 13862-78-7) were used without further purification.For the electrospray ionization, (NH 4 ) 2 MoS 4 or (NH 4 ) 2 WS 4 solutions with an elevated concentration (10 mm in 1:1 water:isopropyl-alcohol) were used to promote the condensation of the Mo or W species in the generated electrospray microdroplets, as suggested by refs.[49,50] Using the ESIBD technique, described in detail elsewhere, [73] the negative ions obtained from the electrospray were characterized by using a home-built time-of-flight mass spectrometer, mass-selected using the quadrupoles, and aimed onto the surface (e.g., graphene on a TEM grid) held at room temperatures in a high vacuum (HV) chambers of 10 −7 mbar.The intact landing of the deposited MoS or WS ions was ensured by applying a voltage on the surface which would decelerate the incident ions to a low kinetic energy of ≈3 eV, considered to be well in the range of "soft landing". [36,74]Following the deposition, the sample was transferred to an HV load lock chamber, which was subsequently vented with dry nitrogen gas before the sample was taken out into ambient atmosphere and transferred into the STEM instrument for the imaging experiment in vacuo.Ion currents and deposition times in the experiments varied between 10-50 pA and 20-240 min, according to the desired coverage and the ion species (Table S1, Supporting Information).
HAADF-STEM Imaging: STEM imaging was performed with an aberration-corrected JEOL ARM200F STEM instrument, equipped with a cold-field emission gun, a spherical aberration corrector (DCOR, CEOS GmbH), an energy dispersive X-ray detector (JEOL), a GIF Quantum ERS electron energy-loss spectrometers (Gatan), and a GIF CCD camera (Gatan).The HAADF-STEM images were acquired by JEOL ADF detector with a convergent semi-angle of 33.5 mrad and collection semi-angles of 56-234 mrad, with 16 μs per pixel dwell time.The EDX spectra were acquired at 5200 cps with 300 s live time for each spectrum.Several scans were performed on the same area to obtain a cumulative spectrum with a better signal-to-noise ratio.For EELS experiments, a pixel dwell time of 0.02 s and an energy dispersion of 0.25 eV per channel (resulting in an energy resolution of 1 eV) were used, and the spectra were acquired with a convergent semi-angle of 33.5 mrad and collection semi-angle of 85 mrad for a 5 mm aperture.All measurements were performed at an acceleration voltage of 60 kV of the electron beam.
SEM Imaging: The SEM images were acquired with an FEI SCIOS SEM instrument at 50 nA, 30 kV, and dwell time of 16 μs per pixel.The sample was tilted more than 70°to check for any graphene ripples on the graphene samples.
Ab Initio Calculations: DFT calculations were performed to model the experimental observations with parameters closely following values well known to reproduce the experimental results. [74]All structures were visualized using the VESTA software. [75]To model observations on graphene, the plane-wave based Vienna Ab initio Simulation Package code (VASP, version 5.4.4) [76,77] was used, employing the projection-augmented wave function (PAW) method [78,79] with a cut-off energy of 400 eV, the Perdew-Burke-Ernzerhof (PBE) functional, [80] and the Grimme's DFT-D3 approach. [81]All calculations were performed in a supercell with 30 Å vacuum space by sampling only the gamma point of the k mesh.The relaxation calculations were performed until the forces were below 0.01 eV Å −1 for all atoms.The adsorption energies (E ads ) were defined as the energy released when a molecule was adsorbed at a surface (positive value means the adsorption process is exothermic).The charge of the molecule on graphene was analyzed by the Bader's atom-in-molecule formalism [82] using the Henkelmann algorithm. [83]The MD calculations were run as a microcanonical ensemble preserving the number of atoms (N), the volume (V), and the energy (E).For the landing dynamics calculations, HMo 8 S 25 molecule was placed ≈15 Å above the graphene and had the velocities of all atoms initialized by random velocities sampled from the Boltzmann distribution at 298 K.In addition to these velocities, every atom in the MoS molecule was added with a velocity corresponding to 3 eV of molecular translational energy toward the graphene.For the collision dynamics calculations, two "molecular" Mo 8 S 16 , one as the target and another as the projectile, were placed on graphene with various angles and impact parameters, and had the velocities of all atoms initialized by random thermal velocities at 298 K. To approximate the thermal reaction between the two molecules, ≈90 meV of translational energy was added to every atom in the projectile MoS 2 molecule toward the target MoS 2 molecule.To model the gas-phase MoS ions, the ORCA code (version 5.0.3) [84]was used, employing PBE functional, [80] DFT-D3 correction, [81] and the ma-def2-SVP basis sets [85,86] with auxiliary basis sets chosen automatically. [87]mage Analysis: Prior to analysis, all images were calibrated using the lattice parameters of single-layer graphene observed by STEM imaging.Distances were measured using the WSXM software, [88] and all errors reported in the paper are the standard deviation.For the analysis of "molecular" MoS 2 on the surface, interacting pairs of "molecular" MoS 2 were categorized as either head-to-head (HH), head-to-side (HS), or side-to-side (SS) interactions.First, interacting pairs of "molecular" MoS 2 on surface were identified based on their Mo-Mo distances.For a pair of "molecular" MoS 2, i.e., molecules A and B, it was considered that the molecules were interacting if any Mo atom in molecule A (Mo A ) was found below 4.4 Å away from any Mo atom in molecule B (Mo B ).The 4.4 Å threshold was determined by measuring the typical nearest distance between Mo A and Mo B in a pair of "molecular" MoS 2 adjacent to each other.Following this procedure, the type of molecular interactions was categorized by examining whether Mo A and Mo B belonged to the "head" (H) Mo-atoms or the "side" (S) Mo-atoms.The "H" Mo atoms were the two Mo atoms at each terminal of the "molecular" MoS 2 , where the "S" Mo atoms were the other non-terminal Mo atoms.These allowed the molecular interactions to be categorized as either head-to-head (HH), head-to-side (HS), or side-to-side (SS).For the analysis of perimeter-to-area (PtA) ratio, the ratio of the measured nanoribbon edge length against the measured nanoribbon area was computed.For an insightful comparison, the obtained ratio was compared with that for an ideal nanoribbon, whose width and length followed that measured for the MoS 2 nanoribbons.For example, for the ≈4 nm wide nanoribbon obtained for the N ≥ 4 case shown in Figure 3a, the PtA ratio obtained experimentally was 2.3 ± 0.5 nm edge length per nm 2 of the nanoribbon area, while the PtA ratio of an ideal, nonporous nanoribbon was 0.6 nm edge length per nm 2 of the nanoribbon area.This results implied that the experimentally observed nanoribbons had ≈3.8 times more edge length per nanoribbon area than an ideal, solid nanoribbon.
Statistical Analysis: All statistical measurements were presented as mean ± SD, where SD is the standard deviation.The width distributions of the nanoribbon were subjected to Welch's ANOVA test, well-suited for samples with unequal variances and sample sizes, implemented in Python's pingouin package. [89]

Figure 1 .
Figure 1.MoS ions deposited on graphene assemble to give single-layer MoS 2 nanoribbons.a) Mass-selected MoS ions were soft-landed with 3 eV landing energy at a single-layer graphene by Electrospray Ion Beam Deposition (ESIBD) and assembled into MoS 2 nanoribbons as observed by Scanning Transmission Electron Microscopy (STEM) (see Methods).b) Time-of-flight mass spectrum of the MoS ions obtained from electrospray (blue) and massselected MoS ions used for surface deposition (red), showing a series of [HS(MoS 3 ) N ] 1-ions (N = 4-8).c) The MoS 2 nanoribbons were imaged at the atomic level by High-Angle Annular Dark-Field (HAADF) STEM imaging, showing a typical length of ≈1 μm and width of ≈4 nm.

Figure 2 .
Figure 2. Detailed structures of the MoS 2 nanoribbons revealed by STEM-HAADF imaging and DFT calculations.a) Atomic-resolved STEM-HAADF image reveals "condensed" 1H-MoS 2 domains (green box) surrounded by coalesced "molecular" MoS 2 (blue box).The image shows one typical contrast for Mo atoms and three different contrasts for S atoms (see Figure S5, Supporting Information for details), indicating three distinct geometries of S atoms in the nanoribbons.b) Computed structures obtained from the Density Functional Theory (DFT) calculations interprets the STEM-HAADF images to unveil the atomic structures of "condensed" and "molecular" MoS 2 observed in the nanoribbons.

Figure 3 .
Figure 3. Varying deposited MoS ions tunes the width of formed MoS 2 nanoribbons.Varying deposited [HS(MoS 3 ) N ] 1-ions on graphene from a) N ≥ 4, b) N ≥ 5 to c) N ≥ 6 increases the average width of the resulting nanoribbons from 4.7 to 7.3 nm.

Figure 4 .
Figure 4. Deposition of MoS and WS ions on graphene yields various MoS-and WS-based core-shell and alloyed heterostructures.Both MoS ions [HS(MoS 3 ) N ] 1-(N ≥ 6) and WS ions [HS(WS 3 ) N ] 1-(N ≥ 4) are respectively found to assemble on graphene into a) MoS 2 nanoribbons and b) WS 2 nanoribbons.Sequential deposition of MoS ions followed by WS ions is found to generate core-shell heterostructures with c) an MoS-core and a WS-shell, whereas the deposition of WS ions followed by MoS ions results in the same core-shell structures with d) a WS-core and an MoS-shell.e) Concurrent deposition of MoS and WS ions results in alloyed nanostructures containing Mo, W, and S. Detailed imaging in the inset shows the substitution of Mo atoms by W atoms, and vice versa, across the lattice.