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A Study on the First-Derivative Output Properties of GaN Static Induction Transistor with Submicrometer Fin Width

  • First Published: 06 February 2020
A Study on the First-Derivative Output Properties of GaN Static Induction Transistor with Submicrometer Fin Width Issue 2, 2020

The Schottky-barrier static induction transistor (SIT) does not require any p-type materials and gate dielectrics for its operation, providing a straightforward way to develop GaN-based high-frequency power devices. The first derivative of output curves of a Schottky-junction vertical channel GaN SIT with sub-micrometer-sized fin was studied by Jaeyi Chun et al. at Stanford WBG-Lab (article number 1900545) to understand its fundamental electrical properties. The derivative of output curves increases as a function of drain voltage in ohmic region due to the raised potential minima in the channel, which has not been seen in SITs with relatively long fin width.

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  • First Published: 06 February 2020

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Turbostratic Stacking Effect in Multilayer Graphene on the Electrical Transport Properties

  • First Published: 06 February 2020
Turbostratic Stacking Effect in Multilayer Graphene on the Electrical Transport Properties Issue 2, 2020

Anomalous carrier transport properties in turbostratic multilayer graphene have been studied by Ryota Negishi et al. in article number 1900437. The conductance and carrier mobility in the synthesized turbostratic multilayer graphene are higher than those of the monolayer graphene used as growth template. The enhancement is caused by a screening effect in multistacking and by a turbostratic stacking effect where the band structure of the multilayer graphene is similar to that of the monolayer graphene.

Editorials

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Compound Semiconductors

  • First Published: 06 February 2020

Review Articles

Zinc Oxide Grown by Atomic Layer Deposition: From Heavily n-Type to p-Type Material

  • First Published: 18 October 2019
Zinc Oxide Grown by Atomic Layer Deposition: From Heavily n-Type to p-Type Material Issue 2, 2020

ZnO films grown by atomic layer deposition between 100 and 200 °C show strong correlation between growth temperature and conductivity. The films grown at 100 °C are oxygen-rich, show considerably more intensive acceptor photoluminescence and a few times longer photoluminescence decay time than films deposited at 200 °C. They can be converted to p-type when they are doped with N and annealed.

Original Papers

Chemical Vapor Deposition Growth of BN Thin Films Using B2H6 and NH3

  • First Published: 27 August 2019
Chemical Vapor Deposition Growth of BN Thin Films Using B2H6 and NH3 Issue 2, 2020

The chemical vapor deposition for the growth of BN thin films on Al2O3 substrates using B2H6 and NH3 is investigated. Hexagonal BN films with honeycomb-like wrinkle patterns are observed. The BN film shows a Raman shift at 1369 cm−1 with a full width at half maximum of 20 cm−1, corresponding to the first-order E2g symmetry vibrational mode in h-BN.

Significant Effects of the D Band on the Hall Coefficient and the Hall Mobility of n-InP

  • First Published: 10 September 2019
Significant Effects of the D− Band on the Hall Coefficient and the Hall Mobility of n-InP Issue 2, 2020

The Hall-effect measurement data on n-InP samples reported in the literature are analyzed on the basis of an impurity-Hubbard-band model to show the significant effects of the top Hubbard band (D band) on the Hall coefficient and the Hall mobility. The reliable values of the activation energy of hopping Hall mobility in the top Hubbard band are deduced.

High Stability of Epitaxial Graphene on a SiC Substrate

  • First Published: 02 August 2019
High Stability of Epitaxial Graphene on a SiC Substrate Issue 2, 2020

The effects of strong-acid treatment on an epitaxial graphene film on a SiC substrate are investigated to confirm compatibility with conventional semiconductor device fabrication processes. An epitaxial graphene film is treated with a piranha solution (H2O2 + H2SO4) for five times. Raman spectroscopy shows almost constant before and after treatment, indicating its quite high stability.

Open Access

n-Doped InGaP Nanowire Shells in GaAs/InGaP Core–Shell p–n Junctions

  • First Published: 02 August 2019
n-Doped InGaP Nanowire Shells in GaAs/InGaP Core–Shell p–n Junctions Issue 2, 2020

n-Doped InGaP:Si nanowire shells in coaxial GaAs/InGaP core–shell and core–multishell nanowires are analyzed regarding donor concentration, ohmic contacts, as well as their implementation as electron-supplying emitter shells in a nanowire heterojunction bipolar transistor. Multi-tip scanning tunneling microscopy, current–voltage and electroluminescence measurements are used for the material characterization and the analysis of carrier transport mechanisms.

Nitrogen Doping Effect in Cu4O3 Thin Films Fabricated by Radio Frequency Magnetron Sputtering

  • First Published: 19 September 2019
Nitrogen Doping Effect in Cu4O3 Thin Films Fabricated by Radio Frequency Magnetron Sputtering Issue 2, 2020

N-doped Cu4O3 thin films are deposited by radio frequency sputtering in an ambient of Ar, O2 and N2. Undoped and N-doped Cu4O3 films show a direct forbidden transition at Eg = 1.34–1.44 eV. All Cu4O3 films show p-type conductivity. N-doped Cu4O3 shows lower resistivity on the order of 101–102 Ω cm. N-doped Cu4O3 is a very promising material in low-cost photovoltaics.

Effects of Dosage Increase on Electrical Properties of Metal-Oxide-Semiconductor Diodes with Mg-Ion-Implanted GaN Before Activation Annealing

  • First Published: 29 August 2019
Effects of Dosage Increase on Electrical Properties of Metal-Oxide-Semiconductor Diodes with Mg-Ion-Implanted GaN Before Activation Annealing Issue 2, 2020

The dependence of the electrical properties of Mg-ion-implanted GaN on the dosage is investigated using metal-oxide-semiconductor diodes. The frequency dispersion in the capacitance–voltage characteristics becomes severe and persistent by increasing the dosage, which is found to result from a discrete interface trap, at 0.2–0.3 eV below the conduction band, generated in GaN by Mg-ion implantation.

The Influence of Ga–OH Bond at Initial GaN Surface on the Electrical Characteristics of SiO2/GaN Interface

  • First Published: 06 November 2019
The Influence of Ga–OH Bond at Initial GaN Surface on the Electrical Characteristics of SiO2/GaN Interface Issue 2, 2020

Herein, the influence of Ga–OH bonds at the SiO2/GaN interface is investigated. The Ga–OH bonds establish negative charges and behave as electron traps. The negative influences of the Ga–OH-related traps are reduced by low-temperature annealing.

Open Access

Avalanche Multiplication Noise in GaN p–n Junctions Grown on Native GaN Substrates

  • First Published: 23 October 2019
Avalanche Multiplication Noise in GaN p–n Junctions Grown on Native GaN Substrates Issue 2, 2020

The low-frequency noise of GaN p–n junctions grown on GaN substrates is characterized. The forward bias noise spectra are predominantly 1/f, whereas in reverse bias the devices exhibit white noise in avalanche. The excess noise factor F and impact ionization ratio α/β are extracted from the noise; F < 1 is obtained, indicating the promise of GaN-based devices for low-noise applications.

Investigation of the Morphology of InSb/InAs Quantum Nanostripe Grown by Molecular Beam Epitaxy

  • First Published: 31 August 2019
Investigation of the Morphology of InSb/InAs Quantum Nanostripe Grown by Molecular Beam Epitaxy Issue 2, 2020

Morphology evolution of InSb/InAs quantum nanostripes (QNSs) grown by molecular beam epitaxy with respect to the number of InSb monolayers is investigated. The dominant lateral growth is explained by the difference in surface energy along each direction, which corresponds to different atomic arrangements in the crystalline structure of InSb. The shrinkage of embedded QNSs in the lateral dimension is observed.

Chemical Vapor Deposition of Boron-Incorporated Graphitic Carbon Nitride Film for Carbon-Based Wide Bandgap Semiconductor Materials

  • First Published: 30 October 2019
Chemical Vapor Deposition of Boron-Incorporated Graphitic Carbon Nitride Film for Carbon-Based Wide Bandgap Semiconductor Materials Issue 2, 2020

The B incorporation into graphitic carbon nitride (g-C3N4) films with various compositions through the thermal chemical vapor deposition is investigated. The B incorporation into g-C3N4 films is revealed by X-ray photoelectron spectroscopy. The photoluminescence (PL) peak shifts from 2.75 eV for unintentionally doped g-C3N4 to 3.60 eV for B-incorporated g-C3N4 with a composition of 8.0%.

Ethanol Detection at the Parts per Billion Level with Single-Stranded-DNA-Modified Graphene Field-Effect Transistors

  • First Published: 27 August 2019
Ethanol Detection at the Parts per Billion Level with Single-Stranded-DNA-Modified Graphene Field-Effect Transistors Issue 2, 2020

Single-stranded-DNA-modified graphene field-effect transistors (FETs) detect ethanol gas at the parts per billion (ppb) level and the different DNA sequences cause a difference in ethanol sensing, owing to the change in DNA conformation when gas is adsorbed. Therefore, the devices have considerable potential to detect various gases at a low concentration for practical breath analysis.

Detection of Nonradiative Recombination Centers in GaPN (N:0.105%) by Below-Gap Excitation Light

  • First Published: 06 October 2019
Detection of Nonradiative Recombination Centers in GaPN (N:0.105%) by Below-Gap Excitation Light Issue 2, 2020

The two-wavelength excited photoluminescence (TWEPL) method reveals the presence of nonradiative recombination (NRR) centers in GaPN (N:0.105%). Different contribution of one and two-level models explains the energy dependence of below-gap excitation (BGE). The shift of Fermi-energy in the mid-gap level according to above-gap excitation (AGE) photon number density plays an important role in the interpretation of NRR processes, which must be minimized for improving intermediate band solar cells (IBSCs).

Influence of a Longitudinal Field on the Large In-Plane Nuclear Field Formation in Single Quantum Dots

  • First Published: 19 October 2019
Influence of a Longitudinal Field on the Large In-Plane Nuclear Field Formation in Single Quantum Dots Issue 2, 2020

In single self-assembled InAlAs quantum dots, the role of nuclear quadrupole interaction (NQI) in the in-plane nuclear field formation is studied by the Hanle-effect measurements. The origin of NQI and the influence of a longitudinal magnetic field are revealed. The results indicate the multirole of the NQI in the in-plane nuclear field formation.

Below-Bandgap Photoluminescence from GaAs

  • First Published: 03 December 2019
Below-Bandgap Photoluminescence from GaAs Issue 2, 2020

The photoluminescence of below-bandgap defects from thermally treated semi-insulating GaAs is investigated. Various electronic states that give rise to near-infrared luminescence peaks are generated through thermal treatment at temperatures that are standard for epitaxial growth of InAlGaAs structures on (001) GaAs substrates. The identities of these defects are also proposed.

Emission at 1.6 μm from InAs Quantum Dots in Metamorphic InGaAs Matrix

  • First Published: 26 September 2019
Emission at 1.6 μm from InAs Quantum Dots in Metamorphic InGaAs Matrix Issue 2, 2020

Herein, the growth of InAs quantum dots (QDs) on a five-step graded InGaAs metamorphic buffer layer (MBL) by molecular beam epitaxy is reported. Anisotropic relaxation along the [−1 1 0] and [1 1 0] directions in the InGaAs MBL is revealed by reciprocal space mapping. Emission at 1.6 μm from the metamorphic InAs QDs is observed at room temperature.

Novel Fabrication Technique of Suspended Nanowire Devices for Nanomechanical Applications

  • First Published: 31 October 2019
Novel Fabrication Technique of Suspended Nanowire Devices for Nanomechanical Applications Issue 2, 2020

A novel fabrication method for suspended nanowire (NW) mechanical devices is developed, which uses inkjet-printing and trenches filled with PMGI for the precise assembly of suspended NWs. The method enables us to make more complex and more advanced nanoelectromechanical system (NEMS) devices such as quantum structures coupled with nanomechanical systems.

Turbostratic Stacking Effect in Multilayer Graphene on the Electrical Transport Properties

  • First Published: 26 September 2019
Turbostratic Stacking Effect in Multilayer Graphene on the Electrical Transport Properties Issue 2, 2020

The carrier transport properties of a turbostratic multilayer graphene are evaluated. The values of the conductance and carrier mobility in the multilayer graphene are higher than those of the monolayer graphene. The enhancement of electrical performance is explained by a screening effect of the charged impurities on the device due to the multistacking.

Evaluate Fixed Charge and Oxide-Trapped Charge on SiO2/GaN Metal-Oxide-Semiconductor Structure Before and After Postannealing

  • First Published: 14 December 2019
Evaluate Fixed Charge and Oxide-Trapped Charge on SiO2/GaN Metal-Oxide-Semiconductor Structure Before and After Postannealing Issue 2, 2020

SiO2 thickness is varied to evaluate the bulk oxide charges and near-interface charges in SiO2/GaN metal-oxide-semiconductor capacitors. From the analysis, it can be said that the bulk charges have a negative value, and interface charges have a positive value. In addition, it is revealed that the positive charges near the interface are present up to about 25 nm from GaN.

High-Temperature Annealing of Sputter-Deposited AlN on (001) Diamond Substrate

  • First Published: 05 September 2019
High-Temperature Annealing of Sputter-Deposited AlN on (001) Diamond Substrate Issue 2, 2020

A novel fabrication process of hexagonal aluminum nitride (AlN)/(001) diamond by means of sputtering and high-temperature annealing is proposed. The in-plane epitaxial relationship in AlN/diamond structure is stabilized in the single domain of (0001) [11–20] AlN || (001) [110] diamond on single-crystal diamond substrates with off-cut angle along [110].

A Study on the First-Derivative Output Properties of GaN Static Induction Transistor with Submicrometer Fin Width

  • First Published: 06 November 2019
A Study on the First-Derivative Output Properties of GaN Static Induction Transistor with Submicrometer Fin Width Issue 2, 2020

The fundamental electrical properties of a Schottky-junction vertical channel GaN static induction transistor, based on the analysis of the first derivative of its output curve, are discussed. The results cover the unique properties of conduction mechanism in a submicrometer channel and the device electrostatics governed by the external biases to control the performance of the device.